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Product throughput of the CVC system is ideal
for many applications. For pilot production the CVC system is unsurpassed and
uses the same system for process and development. |
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The CVC sputtering systems
can process substrate pallets one at a time through the optional robotic
chamber slit valve. |
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The CONNEXION
Cluster Tool provides an excellent platform for process development and
rapid transfer into production. The modular design also enables simple
upgrades and extendibility as the process and throughput requirements
change over time. |
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CVC
611
system has been designed with
maximum thin film sputtering process flexibility as major
objective. For the research and development scientist or
production process engineer, the CVC 611 is an ideal tool for
dependable cost effective operation.
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CVC 601
The CVC 601 is a totally
flexible sputtering system with RF diode RF magnetron,
DC diode, DC triode, and DC magnetron sputtering modes.
RF bias and RF sputter etch are also available as
options. |
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CVC
Connexion
The CVC CONNEXION Cluster
Tool meets customer requirements for high-productivity,
clean wafer processing, integrated processing schemes,
improved process controls and low cost of ownership.. |
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