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CHA Mark 50 - Unique Flexibility. |
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Available in either right- or left-handed chamber control panel
configurations, the Mark 50 features a horizontal chamber and
unique slide-down door for easy loading and unloading. The system's
rear door permits convenient access for through-the-wall mounting.
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| Fixturing:
A variety of fixturing options accommodate any wafer size up to 6 inches. |
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THE MARK
50....FOR VERSATILE, HIGH-THROUGHPUT DEPOSITION Rebuilt by CPA,
Inc.
The distinctive simplicity of design, combined with quality
components and workmanship, ensures trouble-free performance
and provides unparalleled serviceability. |
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CHA's Mark 50 System is specifically designed for flexibility
and long term reliability in high production semiconductor metalization
environments. Offering up to 50 percent more throughput than
any other system and handling wafers up to six inches, the system
delivers unmatched operating efficiency. |
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The Mark
50 accommodates a wide variety of deposition equipment, including
source shutters, substrate heaters, wire feeders, deposition
controllers and power supplies. A broad selection of fixturing,
much of which can be interchangeable, is available for the Mark
50, including lift-off, flip-type, single- dome or custom. Using
CHA's planetary fixturing, the system can process up to 108
3-inch wafers, 57 4-inch wafers, 39 5-inch wafers or 21 6-inch
wafers in each deposition cycle. The Mark 50 also provides expanded
choice in sources. The system can be supplied with any commercially
available source, ranging from single and multiple electron
beam sources, magnetron sputtering sources, and resistance sources
to ion-beam sources and RF induction sources.
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For
heating, the system can be equipped with quartz-lamp heaters
of up to 16 kW to produce wafer temperatures exceeding 500°C.
And the chamber is designed to accommodate either
conventional or backside heaters, depending on specific
requirements or system configuration.
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