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The MRC has full
micro-computer control which allows multiple process recipe storage, and
offers complete automation and maximizes uptime.
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The MRC 943 was designed
with the process and the maintenance personnel in mind. Both loadlock
and process chamber are accessible from the front at a convenient
height.
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The hydraulically lifted top
plate opens up the system and makes target exchange, clean up and
maintenance an easy task. The deposition shields, he anode plane and the
chain drive shields are all removable for cleaning. All vacuum components
are readily accessible and cover panels are unlatched in seconds for
access whenever maintenance is necessary. |
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The MRC 943 is a batch sputtering
system designed for process flexibility usually found only in
R&D systems. The MRC provides 3 targets in-line with
bi-directional and multi-pass scanning, allowing the
deposition of superior quality films in a wide range of
modes. |
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The
Unique high throughput loadlock features a dual-level
elevator, radiant heater for out-gassing and it's own
1,500 I/sec. cryopump for rapid pumpdown, while a
second pallet continues simultaneously uninterrupted. |
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The high
vacuum pumping of the loadlock maintains very low partial
pressures of contamination gases and ensures excellent film
quality. |
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The standard MRC 943
configuration includes computer control and an interactive
keyboard and CRT display system. This allows for easy entry
of process parameters and pallet scan mode. All ancillary
components, such as DC power supply, mechanical pump and both
cryopump compressors, are located behind the system up to 10
feet away. |
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